Stefan Harrer, Dr.

Technische Universität München
Lehrstuhl für Nanoelektronik

Theresienstrasse 90
80333 München

 

 

google scholar profile

google scholar profile

Dissertation by Stefan Harrer

2008

  • Harrer, Stefan: Next-Generation Nanoimprint Lithography: Innovative Approaches Towards Improving Flexibility And Resolution Of Nanofabrication In The Sub-15-nm Region. Dissertation, 2008 more… BibTeX Full text (mediaTUM)

Publications

2010

  • Scarpa, G.; Abdellah, A.; Exner, A.; Harrer, S.; Penso Blanco, G.; Wiedemann, W.; Schmidt-Mende, L.; Lugli, P.: Patterning poly(3-hexylthiophene) (P3HT) in the sub-50-nm Region by Nanoimprint Lithography. Nanotechnology, IEEE Transactions on (Volume:10 , Issue: 3 ) , 2010, 482 - 488 more… BibTeX Full text ( DOI )

2009

  • Harrer, S.; Strobel, S.; Scarpa, G.; Abstreiter, G.; Tornow, M.; Lugli, P.: Direct nanotransfer printing of metal electrodes with sub-15-nm-gaps. Nanotech Conference & Expo 2009 NSTI & CTSI, SPL Methods;Bottom up assembly, 2009Houston TX USA, May 3-7, 2009 2009-05 more… BibTeX
  • Harrer, S.; Strobel, S.; Scarpa, G.; Tornow, M.; Abstreiter, G.; Lugli, P.: Technology assessment of a novel high-yield lithographic technique for sub-15-nm direct nanotransfer printing of nanogap electrodes. Nanotechnology, IEEE Transactions on (Volume:8 , Issue: 6 ) , 2009, 662-670 more… BibTeX Full text ( DOI )
  • Scarpa, G.; Harrer, S.; Abdellah, A.; Penso-Blanco, G.; Lugli, P.; Strobel, S.; Abstreiter, G.; Tornow, M.: Pattern generation by using high-resolution nanoimprinting and nanotransfer printing techniques. Nanotechnology, 2009. IEEE-NANO 2009. 9th IEEE Conference on, 432-438 (2009), IEEE Xplore Digital Library, 2009Genoa, Italy, July 26 - 30, 2009 more… BibTeX
  • Strobel, S.; Harrer, S.; Blanco, G.P.; Scarpa, G.; Abstreiter, G.; Lugli, P.; Tornow, M.: Planar Nanogap Electrodes by Direct Nanotransfer Printing. Small Volume 5, Issue 5, pages 579–582, 2009, 579-582 more… BibTeX Full text ( DOI )

2008

  • Harrer, S.; Strobel, S.; Scarpa, G.; Abstreiter, G.; Tornow, M.: Lugli, P.: Room temperature nanoimprint lithography using molds fabricated by molecular beam epitaxy. Nanotechnology, IEEE Transactions on (Volume:7 , Issue: 3 ) , 2008 more… BibTeX Full text ( DOI )
  • Lugli, P.; Harrer, S.; Strobel, S.; Brunetti, F.; Scarpa, G.; Tornow, M.; Abstreiter, G.: Advances in nanoimprint lithography. Proceedings of the 7th IEEE International Conference on Nanotechnology. IEEE., IEEE Xplore Digital Library, 2008HongKong, Aug 02 - 05, 2007 more… BibTeX Full text ( DOI )
  • Strobel, S.; Harrer, S.; Penso-Blanco, G.; Scarpa G.; Abstreiter, P.; Lugli, P.; Tornow, M.;: Preparation of 25 nm spaced PdAu metal electrodes on silicon by direct nanotransfer printing. 55th AVS International Symposium Nanomanufacturing Focus Topic Room: 309 - Session NM+EM+PS+NS+NC-ThM, 2008Boston MA USA, Oct. 19 - 24, 2008 more… BibTeX
  • Strobel, S.; Harrer, S.; Penso-Blanco, G.; Scarpa, G.; Abstreiter, G.; Lugli, P.; Tornow, M.: Deposition of PdAu thin films sectioned by sub-15-nm gaps on silicon using direct nanotransfer printing. 2008 8th IEEE Conference on Nanotechnology (NANO). IEEE. , IEEE Xplore Digital Library, 2008Arlington TX USA, Aug 18 - 21, 2008 more… BibTeX Full text ( DOI )